Chemical Physics Seminar

Fluoropolymers for Use in Next Generation Photolithography, Soft Lithography, Microfluidics and Proton Exchange Membranes

Joseph M. DeSimone, William R. Kenan, Jr. Distinguished Professor of Chemistry and Chemical Engineering, Department of Chemistry, The University of North Carolina at Chapel Hill,

"Fluoropolymers for Use in Next Generation Photolithography, Soft Lithography, Microfluidics, and Proton Exchange Membranes," Joseph M. DeSimone, Kenan Distinguished Professor of Chemistry and Chemical Engineering, University of North Carolina at Chapel Hill.

Event Sponsors:

Division of Chemistry and Chemical Engineering - More events from this Sponsor

For more information, please contact Priscilla Boon by phone at 6524 or by email at [email protected].